Computer Aided Design: Gerber

Introduction to Accumark, Pattern Design, and Product Data Management

  • ©2007
  • 336 Pages
  • full color | CourseSmart ISBN: 978-1-60901-440-7 | hardcover | spiral bound | 7 x 9
  • 978-1-56367-437-2
$75.50
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Introduction to AccuMark, Pattern Design, & Product Data Management provides step-by-step instructions to Gerber Technology's in-demand software programs. AccuMark, used to copy patterns into the computer, is covered from the basics of data storage and retrieval to the complexities of digitization. The Pattern Design section details the sizing and measuring, point and notch, line, and piece functions necessary to translate creativity into pattern reality. Rounding out the book are instructions in Product Data Management (PDM), including design and cost specifications. Together, these three computer aided design (CAD) programs are the industry standard. This clear, user-friendly book is the companion tool students need to master them, and to maximize their technological savvy in today's dynamic fashion industry.

Also available on CourseSmart
  • Reviews grading and garment construction
  • Illustrations of functions, commands, and examples
  • "Hints for Success": to help students avoid common mistakes
  • Exercises culminating in a portfolio of projects to show a prospective employer
  • Summaries, key terms, and review questions at the end of each chapter
  • Glossary of terminology
  • Appendices with grade rule table and fraction/decimal conversion chart

Instructors Resources
  • Instructor's Guide
  • Getting Started in AccuMark
  • Introduction to Grading
  • Digitizing
  • Getting Started in Pattern Design
  • Measure, Edit, and View Functions
  • Point and Notch Functions
  • Line Function
  • Piece Function
  • Marker Making
  • WebPDM

Instructors and Students:

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Virginia Hencken Elsasser , MS, is an Associate Professor of fashion in the Communication and Fine Arts Department of Centenary College. She has taught courses focusing on textile science and performance, the social/psychology of clothing, elements of design, and retailing. She is a member of International Textile and Apparel Association (ITAA) and Educators for Socially Responsible Apparel Business (ESRAB).
Julia Sharp is an Adjunct Professor at Queens College and Centenary College, and a theater costume designer. She has taught courses in apparel construction and design, textile science, and computer-aided design. She is a member of the Costume Society of America (CSA) and the International Textile and Apparel Association (ITAA).

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