A step-by-step guide to Lectra System's two related software programs, Modaris and Diamino for Apparel Design gives students and professionals working in apparel design and product development the technical know-how they need to succeed. Modaris is used for all phases of pattern development, including pattern manipulation, drafting, and grading. After the patterns are created, they are transferred to Diamino, the marker-making program. Together these programs create the final project. View
U4ia for Apparel Design: Quick Guide is a companion to the main text, U4ia for Apparel Design. It is a handy reference tool that provides easy access to the basic U4ia functions. This quick guide is designed to remain at a computer workstation and to be compact and mobile. View
U4ia for Apparel Design is a user-friendly manual that illustrates the tools and techniques needed to become proficient in using Lectra's computer aided design (CAD) program, U4ia 6.0. U4ia 6.0 is a product visualization software program currently used by many apparel and textile manufacturers and retailers, including Liz Claiborne, The Gap, and Saks. This book, with accompanying CD-ROM, provides detailed instructions on how to use U4ia—from creating a new canvas to using special shortcut tools. View